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Nano pillars in photoresist Nano pillars in photoresist

Ideas Competition NanoMikro.NRW

May 5, 2009 - Together with the company Raith GmbH and the Technical Univerity of Dortmund temicon was one of the winners on the ideas competition NanoMikro.NRW. For the development work in the FIT project "Throughput and cost efficient electron beam lithography for innovative MST applications" the company receives a funding of 250.000,- Euro.