Interference lithography is an unique technology to fabricate highly periodic as well as stochastic surface relief structures in photoresist materials. It is possible to process patterns with a period between 200 nm and 100 µm.
By modification of process parameters, a large variety of different profile shapes can be generated. One- and two-dimensional structures are realized, whereas the structure geometry could be sinusoidal, parabolic, triangular or even binary.
The strength of interference lithography is its upscaling potential to very large, seamless structured areas with a beautiful homogeneity (up to one square meter and even larger).