Roll-to-roll

Wide product range – versatile solutions

Are you looking for a partner for large-area and cost-effective nanostructuring and microstructuring? As our customer, you benefit from our unique roll-to-roll production lines and the comprehensive know-how of a technology leader in the nanoimprinting process.

temicon turns your product ideas into reality. From the initial feasibility study to industrial mass production. For the cost-effective series production of nanostructured and microstructured films and sheets, we have different roll-to-roll or roll-to-plate lines available, depending on your requirements.

With this technology, we serve the following industries:

• Display
• Solar
• Lighting

In technical literature, the roll-to-roll process is abbreviated as R2R. The special temicon technology is called R2R NIL: Combining "roll-to-roll" with "nano-imprint lithography" (NIL). The roll-to-roll manufacturing process with multiple rolls enables cost-effective nanostructuring or microstructuring of flexible surfaces with high throughput.

In UV nanoimprint, replication of microstructures or nanostructures is done using a UV-curable polymer. This UV-curable resin layer applied to the substrate is used in the roll-to-roll process as an intermediate layer between the stamp and the substrate to pattern the film.

Roll-to-roll coating enables seamless replication and consistent layer thickness. The imprint tool used can be reused for subsequent nanoimprinting production.
 

Nano- and microstructures as desired

It is possible to imprint structures with sizes ranging from a few nanometers to 200 µm. Films with thicknesses between 36 µm and 250 µm and widths of up to 1150 mm can be used. The maximum structure width is 1050 mm.

In addition to the roll-to-roll process (R2R), we offer nanoimprinting as a roll-to-plate process (R2P). This means that in addition to films, rigid materials can also be structured at temicon using nanoimprint lithography.

As in the roll-to-roll process, a synthetic resin cured by UV light serves as an intermediate layer for the lithographic imprint of the nanostructures in the R2P NIL process.